Synaptic Plasticity of Memristors Based on ZnO Thin Films Fabricated by PLD
DOI:
https://doi.org/10.6911/WSRJ.202605_12(5).0001Keywords:
Memristor; Synaptic Plasticity; Resistance Switching; ZnO; PLD.Abstract
Cu/ZnO/Cu memristive devices with planar-structure were successfully fabricated using pulsed laser deposition (PLD) technology by regulating substrate temperature. At a substrate temperature of 500 °C, ZnO thin film of the device exhibits smooth and uniform surface morphology demonstrated by systematic characterization. Such memristive devices show excellent dynamic resistive switching behavior under electrical pulse stimulation, with their resistance states capable of being precisely modulated by the polarity, amplitude, and duration of electrical pulses. Leveraging this tunable resistive switching property, the devices successfully emulate various biological synaptic behaviors including excitatory postsynaptic current and paired-pulse facilitation, demonstrating promising potential for applications in neuromorphic computing.
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